Snow, a company specializing in camera and AI filter technology, announced on the 13th that its research paper has been accepted to ECCV 2026 (European Conference on Computer Vision), one of the most prestigious conferences in the field of computer vision. This year's event will be held in Malmö, Sweden, this coming September. The paper, 'H-Adapter: Pose-Robust Hairstyle Transfer via Attention-Derived, Source-Aligned Hair Masks,' was jointly conducted by Snow AI Lab researcher Park Sang-hoon and research intern Jung Seul-gi. The core of the research lies in solving the 'head posture mismatch' problem for AI-based hairstyle transformation technology by applying a 'Region-specific Loss' function that trains hair and face regions separately, securing 'Pose-Robust' performance. The achievement stems from Snow's research internship program, operated for the first time this year, where master's and doctoral-level researchers provided close support throughout the entire process from thesis planning to model improvement and technology verification.